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A compact, versatile, affordable
Multi-Chamber Photoresist Stripper
for your production fab:
THE GEMINI
A high-throughput system designed specifically for the demands of today's production fabs. Compact, inexpensive and versatile. By employing ICP, microwave and RF bias power as needed, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate the SST-Lightning microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.
100-300mm wafers. Etch rate up to 6um/min.
Low plasma damage. Self-tuning.
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