The ASD Workshop was initiated in 2016 to provide a scientific communication channel to learn and exchange about selective deposition techniques. It has since offered a forum for open discussions between researchers from academia and industry. The meeting will include one day of Tutorials followed by the Workshop at ETEC Building (University at Albany). The last day of the workshop will highlight the state of the art of SC devices and processes at NY state with invited presentation from our main industrial partners at Albany Nanotech complex. The 2026 Area Selective Deposition Workshop (ASD 2026) will take place March 29-April 1, 2026, at the University at Albany in New York, but it will be in two different locations:

• March 29-31, 2026: ETEC Building
• April 1, 2026: NY CREATES’ Albany NanoTech Complex

Topics:

The conference will cover a wide range of topics including the following:

• Processes and mechanisms for area-selective chemical vapor deposition (CVD)
• Processes and mechanisms area-selective atomic layer deposition (ALD)
• Selectivity in thin film etching, including atomic layer etching (ALE)
• Mechanisms and surface-dependent thin film nucleation and growth
• Surface passivation for controlled nucleation and growth
• Patterned deposition resists, including organic monolayers, for selective deposition
• Metrology for Area-Selective Deposition
• Applications for area-selective deposition in IC: ASD for bottom-up fill, ASD for memory, ASD for 2D devices…
• Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
• Selective deposition of and on 2D materials
• Topographical Selective Deposition
• ASD and sustainability
• AI and machine learning for ASD
• Selective Infiltration
• Self-Assembly structures
• Selective epitaxial growth of semiconductors

ASD 2026 Conference Chair

Christophe Vallée

University at Albany, USA

ASD 2026 Conference Co-Chair

Kandabara Tapily

TEL TTCA, Albany, USA)