Call for Abstracts

Abstract Deadline: December 18, 2026

Registration and Housing is Now Open

Area Selective Deposition Workshop 2027 will provide an international forum for researchers from academia, industry, and national laboratories to discuss advances in area-selective deposition and related selective processing. The workshop will focus on the surface chemistry, nucleation control, inhibition, activation, selective etching, metrology, modeling, and integration strategies needed to enable bottom-up fabrication for Ångström-era semiconductor manufacturing and emerging nanoscale technologies.


Building on the tradition of previous ASD workshops, the program will feature tutorials, invited and contributed talks, poster sessions, and focused discussions designed to promote exchange across disciplines and career stages, connecting early-career researchers, established scientists, equipment suppliers, materials providers, and device manufacturers.


The 2027 Area Selective Deposition Workshop (ASD 2027) will take place April 4-7, 2027, at the Sentinel Hotel in Portland, located at: 614 SW 11th Ave Portland, Oregon 97205.

Topics:


  • Surface Passivation: SAMs, SMIs, Polymers, and Others
  • Metrology and Surface Characterization
  • Mechanisms for Nucleation and Growth
  • Plasma and Selective Etching
  • Film Quality in ASD
  • Sustainability in ASD
  • ASD of 2D materials
  • Multicolor ASD
  • AI and Machine Learning for ASD
  • ASD Modeling
  • ASD Integration and Other Applications
 
 

Keynote Speaker:

Adriaan J.M. Mackus

Associate Professor, Plasma and Materials Processing, Applied Physics Department, Eindhoven University of Technology, Netherlands

ASD 2027 Conference Chairs:

Tania Sandoval

Universidad Técnica Federico Santa María

 

Rachel Nye de Castro

Lam Research

Dennis Hausmann

Lam Research